Photoresist is a chemical essential for semiconductor manufacturing. The photoresists known as a photosensitive material, initiate a chemical reaction in the light. It is a chemical that plays an essential role in photolithography, a technology that is involved in the manufacture of semiconductor devices. In the semiconductor manufacturing, the exposure process that a photoengraving technique is applied to reduce and transfer the design drawn on the original plate (photomask) onto the silicon chip. To create power-saving, high-performance semiconductors, the circuits that are to be transferred need to be rendered smaller.

This report provides a deep insight into the global IC Photoresist market covering all its essential aspects. This ranges from a macro overview of the market to micro details of the market size, competitive landscape, development trend, niche market, key market drivers and challenges, SWOT analysis, value chain analysis, etc.

The analysis helps the reader to shape the competition within the industries and strategies for the competitive environment to enhance the potential profit. Furthermore, it provides a simple framework for evaluating and accessing the position of the business organization. The report structure also focuses on the competitive landscape of the Global IC Photoresist Market, this report introduces in detail the market share, market performance, product situation, operation situation, etc. of the main players, which helps the readers in the industry to identify the main competitors and deeply understand the competition pattern of the market.
In a word, this report is a must-read for industry players, investors, researchers, consultants, business strategists, and all those who have any kind of stake or are planning to foray into the IC Photoresist market in any manner.

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IC Photoresist Market Segmentation :

The research report includes specific segments by region (country), manufacturers, Type, and Application. Market segmentation creates subsets of a market based on product type, end-user or application, Geographic, and other factors. By understanding the market segments, the decision-maker can leverage this targeting in the product, sales, and marketing strategies. Market segments can power your product development cycles by informing how you create product offerings for different segments.

Key Company

• TOKYO OHKA KOGYO CO.
• LTD. (TOK)
• JSR
• Shin-Etsu Chemical
• DuPont
• Fujifilm
• Sumitomo Chemical
• Dongjin Semichem
• Merck KGaA (AZ)
• Allresist GmbH
• Futurrex
• KemLab™ Inc
• YCCHEM Co.
• Ltd
• SK Materials Performance (SKMP)
• Everlight Chemical
• Red Avenue
• Crystal Clear Electronic Material
• Xuzhou B & C Chemical
• Xiamen Hengkun New Material Technology
• Jiangsu Aisen Semiconductor Material
• Zhuhai Cornerstone Technologies
• Shanghai Sinyang Semiconductor Materials
• ShenZhen RongDa Photosensitive Science & Technology
• SINEVA
• Guoke Tianji
• Jiangsu Nata Opto-electronic Material
• PhiChem

Market Segmentation (by Type)

• EUV Photoresists
• ArF Photoresists
• KrF Photoresists
• G-LINE/I-LINE Photoresists
• Others

Market Segmentation (by Application)

• Analog
• Micro
• Logic
• Memory

Opportunities

• Emerging Markets in Asia-Pacific
  Rapid industrialization and growing electronics sectors in Asia-Pacific offer growth opportunities.
• Advancements in EUV Lithography
  Development of EUV technology opens new avenues for advanced photoresists.
• Integration with Flexible Electronics
  Rising interest in flexible and wearable electronics creates new application areas.

Challenges

• Complex Fabrication Processes
  Advanced photoresist manufacturing involves intricate processes, increasing complexity.
• Intense Market Competition
  High competition among key players pressures pricing and innovation.
• Rapid Technological Changes
  Keeping up with fast-paced advancements in semiconductor technology remains challenging.

IC Photoresist Market – Recent Developments in 2025

1. JSR Corporation Expands EUV Photoresist Production in Japan

Real-World Example:

• JSR Corporation, a leading photoresist manufacturer, has expanded its EUV photoresist production facility in Yokkaichi, Japan to meet rising demand from semiconductor manufacturers.
• Key Customers: TSMC, Samsung, and Intel have signed supply agreements to use JSR’s high-resolution EUV resists for their 3nm and 2nm chip production.
• Technology Advancement: The new resist formulation improves patterning accuracy and line-edge roughness, critical for next-generation AI and HPC chips.

, February 2025

2. Tokyo Ohka Kogyo (TOK) Develops New ArF Photoresist for 5nm & Below Nodes

Real-World Example:

• TOK, a key player in the ArF (argon fluoride) photoresist market, has developed a new chemically amplified resist (CAR) material optimized for 5nm and below semiconductor nodes.
• Industry Collaboration: Working closely with TSMC and Samsung, TOK’s high-sensitivity ArF resists enhance yield and resolution for advanced logic and memory chips.
• Manufacturing Deployment: Initial trials have been successfully conducted at Samsung’s Hwaseong fab and are now being scaled for mass production.

, January 2025

3. Dow Semiconductor Materials Launches High-Purity Photoresists for Advanced Nodes

Real-World Example:

• Dow has introduced a new generation of high-purity, low-defect photoresists for EUV and immersion lithography.
• Breakthrough: The new formulation reduces defects by 30%, improving wafer yield in 2nm and 3nm semiconductor processes.
• Adoption: Intel and GlobalFoundries have begun evaluating the material for next-generation logic and memory devices.

, January 2025

4. TSMC Strengthens Photoresist Supply Chain for 2nm Production

Real-World Example:

• TSMC has partnered with Shin-Etsu Chemical and JSR Corporation to secure a stable supply of EUV and ArF photoresists for its upcoming 2nm chip production.
• Investment: The company has invested $500 million in photoresist R&D to improve resolution and defect control.
• Expected Production Timeline: The first 2nm chips using these new resists will enter volume production in late 2025.

, February 2025

5. Lam Research & Brewer Science Develop Novel Dry-Resist Technology

Real-World Example:

• Lam Research and Brewer Science have co-developed a dry-resist technology, enabling faster, more precise patterning for advanced semiconductor nodes.
• Key Benefits:
  • Higher resolution than conventional wet photoresists.
  • Improved adhesion, reducing pattern collapse.
  • Reduced chemical waste, making it more environmentally friendly.
• Adoption: GlobalFoundries and UMC are testing the technology for automotive and IoT semiconductor manufacturing.

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FAQs

Q: What are the key driving factors and opportunities in the IC Photoresist market?
A: Key drivers include the growing semiconductor industry, advancements in lithography technologies, and rising demand for consumer electronics. Opportunities exist in emerging Asia-Pacific markets, EUV lithography advancements, and flexible electronics.

Q: Which region is projected to have the largest market share?
A: Asia-Pacific is expected to dominate the market due to robust semiconductor manufacturing and growing consumer electronics sectors.

Q: Who are the top players in the global IC Photoresist market?
A: Leading companies include JSR Corporation, Tokyo Ohka Kogyo Co., Ltd., Fujifilm Holdings Corporation, Shin-Etsu Chemical Co., Ltd., and Dow Inc.

Q: What are the latest technological advancements in the industry?
A: Recent innovations include developments in EUV and DUV lithography, enhanced resolution photoresists, and eco-friendly formulations.

Q: What is the current size of the global IC Photoresist market?
A: The global IC Photoresist market was valued at approximately USD 2.5 billion in 2023 and is projected to grow at a CAGR of 6.8% from 2025 to 2032.